Sputter sources
Bestec designs and provides different type of customized and ultra high vacuum (UHV) compatible magnetron sputter source assamblies to be integrated in a Bestec deposition system or as separate component.
Typical design parameters
- Bakeable to at least 150°C.
- Circular or rectangular target shapes possible.
- Manual (in situ) source tilting.
- Manual or pneumatic driven gas inlet valve at the source.
- Integrated gas inlet at the head of the source (close to the target).
Options
- Integration of pneumatic of motor driven tilting is possible.
- Integration of source tranlation is possible.
- Combination of more than one source at a single flange.
